Congratulations to the OHHS Art and Design students whose art was selected as a High Merit piece for the Spring 2025 Celebrating Art competition and publication! Receiving a Top Ten or High Merit award means the art was an exceptional piece. Out of thousands of entries received for the Spring 2025 contest, it stood out as being one of the top 5% submitted. Students who have art selected as Top Ten or High Merit work will receive special recognition in the book as it is displayed as a Top Ten or High Merit piece.

Congratulations to the following students:

From Schorsch’s AP Art and Design Drawing, and Drawing and Printmaking classes: 

Molly Audretch
Baylee Moorman

From Ambs’ Art Foundations class:

Elliot Flaig

From Groh’s Art Foundations class:

Desmond Damon